Non disponible en dehors du Royaume-Uni et de l'Irlande
Application
Tetrakis(dimethylamido)titanium(IV) (TDMAT) is a precursor to titanium nitride (TiN) thin films by organometallic chemical vapor deposition (OMCVD)and titanium dioxide thin films by atomic layer deposition (ALD).TDMAT undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).
General description
Please inquire for bulk quantity, pricing, and packaging options.
Packaging
5, 25 g in ampule
Ce produit répond aux critères suivants: