Étain (II) acétylacetonate, base 99,9% de métaux traces

Code: 697478-5g D2-231

Application

Thin film deposition by atomic layer deposition (ALD)  Atomic layer etching. For use in transistors and other integrated circuit components.

Packagi...


en savoir plus

Votre prix
$147.90 5G
DEMANDER

Application

Thin film deposition by atomic layer deposition (ALD)  Atomic layer etching. For use in transistors and other integrated circuit components.

Packaging

5 g in glass bottle

assay99.9% trace metals basis
bp110 °C/0.1 mmHg
formliquid
InChI keyXDRPDDZWXGILRT-FDGPNNRMSA-L
InChI1S/2C5H8O2.Sn/c2*1-4(6)3-5(2)7;/h2*3,6H,1-2H3;/q;;+2/p-2/b2*4-3-;
Quality Level100
reaction suitabilitycore: tin
SMILES stringCC(=O)C=C(C)O[SnH2]OC(C)=C/C(C)=O
Cas Number16009-86-2
Ce produit répond aux critères suivants: