Non disponible en dehors du Royaume-Uni et de l'Irlande

Application

Spin-coating:Spin-coating a single layer at 2000-5000 rpm yields a final film thickness of 40-60 nm. To achieve thicker films, multiple layers can be applied without a baking step. This is recommended over using a lower spin speed to maintain film uniformity. This ink should work on almost any substrate.Electrical performance:Following a baking step at 300 °C for 30 minutes in air, the spin-coated films exhibit sheet resistance of 300-800 Ω/sq, corresponding to a resistivity of 0.003-0.004 Ω−cm. With 5 coats at 2000 rpm, a 200 nm thick film with a sheet resistance of 160 Ω/sq. is obtained.General guidelines:Ethanol is recommended for cleaning up the ink and dried films, as well as dilution. Bath sonication (5-10 minutes) of the ink prior to use is recommended following extended periods of disuse.

Legal Information

Sold under Materials Transfer Agreement with Mark Hersam group at Northwestern University.