Non disponible en dehors du Royaume-Uni et de l'Irlande

General description

Graphene preparation method: electrochemical exfoliation. Graphene thickness by AFM: 80%, 1-3 layers. Sheet size by AFM: Few micrometers Oxygen content: 7.5% (by XPS) (C/O-ratio: 12.3). Raman I_D/I_G ratio: 0.4. Sheet resistance: 4.8 kΩ/sq. Typical properties of films produced thereof (after dry transfer from PTFE-filter): 15 nm film: 85% transmittance, sheet resistance of 16 kΩ/sq (as made), 4.1 kΩ/sq (after 30 min, 200 °C), ﹤1 kΩ/sq (conc. HNO₃-treatment).25 nm film: 73% transmittance, sheet resistance of 8 kΩ/sq (as made), 2.4 kΩ/sq (after 30 min, 200 °C), ﹤1 kΩ/sq (conc. HNO₃-treatment).

Packaging

5 mL in glass bottle