Hafnium(IV) tert-butoxide, packaged for use in deposition systems

Code: 760463-10g D2-231

Not available outside of the UK & Ireland.

Application

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other h...


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Your Price
$1,449.83 10G
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Not available outside of the UK & Ireland.

Application

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.

Packaging

10 g in stainless steel cylinder

bp90 °C/5 mmHg (lit.)
density1.166 g/mL at 25 °C (lit.)
formliquid
InChI keyWZVIPWQGBBCHJP-UHFFFAOYSA-N
InChI1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
Quality Level100
reaction suitabilitycore: hafnium
refractive indexn20/D 1.424 (lit.)
SMILES stringCC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C
Cas Number0002172-02-3
Hazard Class3
Un Number1993
Pack Group3
This product has met the following criteria: