Tris(dimethylamino)silane, packaged for use in deposition systems

Code: 759562-25g D2-231

Not available outside of the UK & Ireland.

Application

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also u...


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£775.00 25G
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Not available outside of the UK & Ireland.

Application

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (﹤150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

Packaging

25 g in stainless steel cylinder

assay≥99.9% (GC)
bp142 °C (lit.)
density0.838 g/mL at 25 °C (lit.)
formliquid
InChI keyTWVSWDVJBJKDAA-UHFFFAOYSA-N
InChI1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
mp−90 °C (lit.)
Quality Level100
SMILES stringCN(C)[SiH](N(C)C)N(C)C
Cas Number15112-89-7
Hazard Class4.3
Un Number3398
Pack GroupII
This product has met the following criteria: