Not available outside of the UK & Ireland.

Application

Will interact with dodecylamine in the formation of intercalation compounds of H⁺-magadiite and used in a study of mixed-metal bioactive glasses.

Commonly used as a precursor to prepare xerogel

Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of: Si oxide Oxycarbide Doped silicate Silanol Siloxane polymer Organosilicon thin filmsThe films can be deposited at low temperatues (﹤250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.

Packaging

25 mL in stainless steel cylinder